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Physics 539: Characterization And Fabrication At The Nanoscale




Course Outline


Characterization: X-raydiffraction, electron microscopy, scanning probe microscopy, transportmeasurements, magnetic properties, optical properties,


Conventional lithographic fabrication: Thin film deposition, optical lithography, wet and dry etching techniques, electron beam lithography, focused ion beam lithography, X-ray lithography


Unconventional lithographic fabrication: Scanning probe lithography, interference or holographic lithography, step growth methods, nanoimprint lithography


soft lithography, near-field opticallithography, shadow masks, nanotemplates, nanosphere lithography, selfassembly, molecular lithography, chemical nanofabrication technique






Lectures T Th 9:25 - 10:40 AM


Homework (50%)


Term papers (25% for each of the two)


Text: Course notes



All information is representative only, and is likely to change from year to year.